Main features of GIGALLOYS

• Low impurities content (specifications)

• Uniformity of composition of alloying elements within the whole ingot

• Homogeneity of the fine grain size (PECHINEY patent)

•  Low hydrogen content

•  Low content of inclusions

• Low alpha emitters (U, Th) content

In order to understand the correlation between the use of our sputtering targets and the steps of manufacturing processes, we propose the total traceability concept with the GIGALLOYS generation

GIGALLOYS are produced using patented processes : FR2744805, US5955673, US5887481, Taiwan 105486. Pending patents in Japan : 115242/96 and 9-529039

Step in process

Purity

Alpha emitters

Cleanliness

Gas content

Homogeneity of composition

Grain size and texture

Origin of 4N base Al

5N refining process

Alloying and liquid metal treatment

Casting process

Forging and heat treatments

1985 : Start of the 5N production

• At that time, the demand for ultra-pure metal emerged as a challenge. The target was to reach 5N5 purity level (99.9995%) for high tech electronics applications. The MERCUS plant attained this level through the use of a new Pechiney segregation technique.

 

• T his new segregation technique made it possible to ensure that certain unwanted metals (thorium and uranium which emit alpha rays) would not exceed 1 ppb (part per billion) in refined aluminum.

1993 : Pechiney High Purity's performance

• The high purity challenge has been met. The MERCUS plant could mass produce 5N and 5N5 metal (over 150 tons/year) with U+Th< 1 ppb level.
  
• Furthermore, the unique "controlled grain" process (PECHINEY patent) guaranted a very homogeneous fine structure of the as-cast products, which ensures an easy control of grain size on the finished targets.
  
• P echiney High Purity had succeeded in mastering the entire range of aluminum purity standards from High Purity (3N-4N) to Ultra High Purity (5N-6N)

Copyright © 1996-2002 PECHINEY HIGH PURITY - Contact Webmaster
updated : 11/15/01